Cosmetic: Removed extra lines

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Todor Totev 2020-05-12 11:41:40 +03:00 committed by GitHub
parent a4e6e5477a
commit a4b554853c
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@ -18,27 +18,21 @@
<Assembly Name="Avalonia.Markup" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Markup.Xaml" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Styling" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.DesktopRuntime" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.DesignerSupport" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Diagnostics" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Dialogs" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Input" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Logging.Serilog" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.OpenGL" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Desktop" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Direct2D1" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.ReactiveUI" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Skia" Dynamic="Required All"></Assembly>
<Assembly Name="Avalonia.Win32" Dynamic="Required All"></Assembly>
<Assembly Name="SkiaSharp" Dynamic="Required All"></Assembly>
<Assembly Name="ReactiveUI" Dynamic="Required All"></Assembly>
<Assembly Name="System.Reactive" Dynamic="Required All"></Assembly>
<Assembly Name="Splat" Dynamic="Required All"></Assembly>
-->
</Application>
</Directives>